The thermal deposition of Co onto Cu(111) results in three-dimensional island growth and a face-centered-cubic-hexagonal-close-packed stacking fault, which hinders a complete antiferromagnetic coupling in Co/Cu(111) superlattices. We report that Co/Cu(111) films can be grown with good layer-by-layer morphology and significantly less stacking faults by pulsed laser deposition. We show that a complete antiferromagnetic coupling can be achieved in the pulsed laser deposited Co/Cu trilayer.